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Nano Scale Surface Systems, Inc. ( ns3 ) supplies technology and equipment based on its core patents:
US Patent #6,015,595. Multiple Source Deposition Apparatus. J. Felts. Jan. 18, 2000.
US Patent #6,068,884. Method of making low .kappa. dielectric inorganic/organic hybrid films. P. Rose, E. Lopata, J. Felts.
May 30, 2000
US Patent #6,112,695. Apparatus for Coating Containers. J. Felts, September 5, 2000.
US Patent #6,180,191. Method for Plasma Deposition of a Thin Film Onto a Surface of A Container. J. Felts, January 30,
2001.
US Patent #6,177,142. Method of Forming a Film on a Substrate. J. Felts. Jan. 23, 2001.
US Patent #6,180,185. Method of Forming a Film on a Substrate. J. Felts, January 30, 2001.
US Patent #6,539,890. Method of Forming a Film on a Substrate. J. Felts, April 1, 2003.
The issued and pending ns3 patent portfolio covers thin film processes and apparatus for inside and/or outside coating
of polymeric containers and other substrates with plasma derived thin films to enhance gas, vapor and aroma barriers, electrical,
optical, mechanical, lubricity, and other properties. Current areas of application include:
Beverages (including water, alcoholic and non-alcoholic)
Food Packaging
Sports
Medical Plastics and Packaging
Medical Devices
Semiconductors
ns3 has developed equipment and technology based on their proven technological approach to produce commercial products
based on high rate, low cost plasma coatings on polymeric substrates (including containers), silicon wafers as well as metals,
glass and ceramic surfaces. ns3 works with its corporate partners to develop and commercialize each technology.
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